Evonik Launches New TEGO® Dispers 695, Comprehensively Enhancing Radiation-Curing Ink Performance
Evonik recently launched an innovative dispersant. TEGO® Dispers 695. This high-performance dispersantDeveloped specifically for radiation-curable inks. Solvent-based polyurethane inks also perform excellently.It sets a new performance benchmark in terms of pigment dispersion efficiency and formulation stability.
Compared to existing dispersed additives, TEGO®"Dispers 695 is not just a simple performance enhancement, but a leap forward in dispersion technology. Developed in close collaboration with our global customers, it delivers outstanding application performance," says Susanne Struck, Head of Global Printing Inks Market Segment in the Coating Additives Business Line at Evonik.
This additive features a high molecular weight, is solvent-free, and has 100% active ingredients, allowing for easy dissolution in various monomers or organic solvents, including alcohol-based systems.
This feature allows formulators to achieve higher pigment loading without thixotropy, while also reducing grind time, andRadiation-cured flexographic, offset, and inkjet inks, and polyurethane-based solvent-based inks. Enhance coloring power.
In the Chinese market, customers have extremely high demands for ink color strength, system stability, and production efficiency.®Dispers 695 not only effectively addresses the dispersion challenges posed by high-performance pigment systems, but also helps customers reduce viscosity and shorten grinding time in actual production, providing greater flexibility for formula optimization and product upgrading.
TEGO®Dispers 695 is suitable for all types of organic and inorganic pigments and is ideal for next-generation high-performance ink formulations.
Evonik Coating Additives offers a comprehensive portfolio of ink copolymer resins and additives for water-based, radiation-curable, solvent-based, and inkjet ink applications.
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